1. Test principle
 
 
Based on Stoney formula of classical substrate bending method, advanced laser scanning method, detection technology and intelligent operation, the thin film stress meter is especially suitable for bow height, contour morphology, curvature radius and thin film of wafer photoelectric thin film samples
Stress measurement.
 
 
 
 
2. Why do you detect film stress?
 
As a necessary item in performance test of semiconductor manufacturing process, MEMS micro-nano processing and photoelectric thin film coating process, thin film stress directly affects the stability and reliability of thin film devices. Excessive thin film stress will cause the following problems:
 
1. Membrane crack
 
2. Membrane peeling
 
3. Membrane wrinkles
 
4. Gap