
Excellent analytical performance Qualitative and quantitative analysis of surface elements The energy analyzer design is combined with the bicrystal micro-focusing monochromatic X-ray source to achieve excellent energy resolution Fast high-resolution parallel imaging Chemical imaging: Spatial resolution better than 1um Backtracking spectrum: Backtracking region is better than 6um Detector without back correction The double detector design of electron multiplier and resistive anode detector can meet the requirements of high performance XPS spectrum acquisition and high spatial resolution XPS imaging. The innovative technology of spatial continuous resistance anode detector makes XPI imaging resolution reach 1um. At the same time, the obtained data has no detector back-bottom characteristics and no back-bottom correction, and the quantitative element distribution imaging results with micron-scale resolution can be directly obtained. Micro-focusing monochromatic source The analysis size can be continuously adjusted between 20 μ m and 900 μ m Excellent sensitivity and energy resolution Provide no less than 20 target working points to ensure that the anode target does not need to be replaced during the lifetime use of the instrument Automatic and efficient ion analysis source New Ar ion clusters are combined with traditional single event ion sources for in-depth analysis of various materials High precision angular resolution XPS The software controls the analysis position and angle to ensure the accuracy and repeatability of the data A complete set of ARXPS data processing tools can calculate the layer thickness of nano-scale multilayer devices One-button charge compensation Equipped with double-beam charge neutralization system, it can be independently controlled and turned on according to the needs of actual samples. Suitable for charge neutralization of all non-conductive samples and rough surfaces Powerful Avantage analysis software Full digital instrument control Visual operation of system software Complete set of XPS standard data library and compound structure identification database Customize data collection to report generation mode Easy to operate Highly automated Analysis area and angle resolution are optional Automatic gas regulation and vacuum control Calibrate at any time Calibration of energy scale and instrument work function Ion gun positioning and ion beam focusing Mouse click sample navigation Real-time display of analysis location High illumination intensity, adjustable intensity Flexible design ISS, ARXPS, and REELS are standard The multifunctional injection room is standard UPS and EDS/AES/SEM/SAM/optional Optional sample pretreatment accessories, including: Sample preparation table, crystal cleaner, sample scraper Sample heating/cooling device Sputtering cleaning ion gun Evaporator High pressure reaction chamber
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