Features:
 
1. Good film forming performance, high uniformity of film thickness, ≤ 3%
 
Good deposition uniformity for inner holes, grooves and high aspect ratio structures;
 
The film thickness can be accurately controlled to one atomic layer;
 
Pin Hole free film can be achieved by large area process
 
Extremely high repeatability and stability
 
Low defect density of materials
 
Amorphous or crystalline films can be grown (selected temperature)
 
2. Excellent vacuum performance, vacuum degree ≤ 5Pa
 
 
3. Touch operation, simple and easy to use;
 
 
The touch screen allows users to easily set the recipe or deposition process and check the movement of each drive system.
 
Automatic deposition can be carried out, and N2 discharge can be completed automatically after deposition.
 
Vacuum exhaust and inert gas introduction of glove box can also be completed automatically.
 
4. Abundant accessories, which can meet various test requirements:
 
 
Substrate rotating frame, powder sample accessories, glove box, ozone generator, tail gas treatment equipment, 200 ℃ precursor heater, dry vacuum pump, etc.;