Technical characteristics
The host includes: vacuum system, temperature control system, pressure control system, water cooling system, PLC control
Control system, software operation interface, ultraviolet light source, single-side electromagnetic heating system
Equipment imprint size: 4 inches.
The equipment can realize hot embossing and ultraviolet exposure embossing
★ High pressure: 8bar (air compressor), 20bar (external ultra-clean room air source)
Temperature range: from room temperature to 250 degrees Celsius.
Ultraviolet source type: high pressure mercury lamp: power: 400W, main wavelength: 365nm.
★ Vacuum degree of equipment: 10 Pa.
★ The equipment can provide a full range of nano-imprint adhesives randomly according to scientific research needs, including:
Hot pressing adhesive, ultraviolet curing adhesive
Deep etching imprint adhesive, Lift-Off imprint adhesive
Rapid template making materials, various template anti-stain agents, substrate tackifier, etc.
★ Customized nanoimprint templates can be provided randomly with the equipment according to scientific research requirements, including: 4-inch dot matrix template with a period of 400nm nickel template SFP ® & Hybrid Mold ® soft template
Support 20nm resolution and curved surface imprinting, and provide document process support,
★ Support automatic demoulding and electromagnetic heating functions
More than 10 customers at home and abroad
★ The process includes:
Spin coating process support of nano-imprint adhesive
Anti-sticking process support of nano-imprint template to avoid the influence of demoulding viscose
Parameter adjustment of nanoimprint machine
Soft template process, including PDMS template, SFP and Hybrid Mold process
ICP etching process
Flexible polymer substrate embossing process, Nickel Template metal Nickel Template hot pressing PET, PMMA, etc
Lift-off process support for machining metal structures
Nanoimprint characterization technology
Update the research and development guidance and literature support of imprint process
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